Open
Description
Instead of specifying geometries "as fabricated", it should be doable to "emulate" process fabrication. This is not as good as physical process simulation, but can be appealing.
- substrate
- GMSH box
- size defines process domain in x, y, z
- masked conformal growth/deposition of thickness t
- create a new entity by
occ.fuse
all existing entities - masking:
occ.cut
vertically across the domain where the mask covers the substrate - apply
occ.dilate
on the entity by the desired thickness (isotropicallya=b=c=t
or directionally e.g.a=b=0
,c=t
; other types of growth at other angles also possible) - if isotropic,
occ.fillet
the dilated entity's curves byradii = t
; this will maintain a distance of t from the previous surface everywhere occ.cut
by the originalocc.fuse
: this also allows tagging of the new grown layer
- create a new entity by
- masked etching
- full overetch hack:
occ.cut
the tag of a grown layer by an infinitely tall box (or other shape if isotropic or non-vertical anisotropy) with x-y dimensions matching mask opening - otherwise can
occ.cut
with a grown gas layer (complement of current fuse with process domain) where exposed
- full overetch hack:
- alternate depositions and etches as needed
- cleanup
occ.cut
outside the process domain in x,y